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Novel site-specific DNA modification in Streptomyces: analysis of preferred intragenic modification sites present in a 5.7 kb amplified DNA sequence.

机译:链霉菌中的新型位点特异性DNA修饰:分析存在于5.7 kb扩增DNA序列中的优选基因内修饰位点。

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摘要

Both Streptomyces lividans and Streptomyces avermitilis encode similar systems of post-replicative DNA modification which act site-specifically on closely opposed guanines on either strand. The modifications can be detected since they react in vitro with an oxidative derivative of Tris, resulting in strand cleavage. Previous analysis of the preferred modification site of plasmid pIJ101 indicated that extensive amounts of flanking sequence, including direct and inverted repeat structures, are required to direct modification in vivo within a central 6 bp palindrome. We have now examined the preferred modification sites of a chromosomal element, the 5.7 kb amplified DNA sequence (ADS5.7) found in certain S. lividans mutants. In contrast to the pIJ101 site, each of the ADS5. 7sites is intragenic and modified with a 10-fold reduced frequency. However, similar extents of flanking sequence are required for authentic double-strand modification; deletion mutants exhibited different modification profiles, including displaced double-stranded or single-stranded modi-fication. Comparison of different modification sites reveals conservation of the central core sequence, but no significant similarities between flanking sequences. Enhanced modification was detected in a cloned region of the ADS5.7, suggesting that local DNA topology, probably influenced by both DNA supercoiling and the nature of flanking sequences, can influence the modifying activity.
机译:淡绿色链霉菌和阿维链霉菌均编码相似的复制后DNA修饰系统,其在位点上特异性作用于任一链上紧密相对的鸟嘌呤。修饰可以被检测到,因为它们在体外与Tris的氧化衍生物反应,导致链断裂。对质粒pIJ101的优选修饰位点的先前分析表明,需要大量侧翼序列,包括直接和反向重复结构,以在中央6bp回文中直接进行体内修饰。现在我们已经检查了染色体元件的优选修饰位点,即在某些紫葡萄链球菌突变体中发现的5.7 kb扩增的DNA序列(ADS5.7)。与pIJ101位点相反,每个ADS5。 7个位点是基因内的,并以降低了10倍的频率被修饰。然而,真正的双链修饰需要相似程度的侧翼序列。缺失突变体表现出不同的修饰谱,包括置换的双链或单链修饰。不同修饰位点的比较揭示了中心核心序列的保守性,但是侧翼序列之间没有显着相似性。在ADS5.7的克隆区域中检测到增强的修饰,这表明可能受DNA超螺旋和侧翼序列性质影响的局部DNA拓扑可影响修饰活性。

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